What is magnetron sputtering?

Magnetron sputtering is a physical vapor deposition (PVD) technique used to deposit thin films onto a substrate. In this process, a target material is bombarded with energetic ions in a vacuum chamber, causing atoms from the target to be ejected and deposited onto another surface. The use of a magnetic field helps to confine the plasma, increasing the efficiency and uniformity of the coating. Magnetron sputtering is widely used in the manufacturing of semiconductors, solar cells, and optical coatings because it provides precise control over film thickness and composition.